Nova Publishers
My Account Nova Publishers Shopping Cart
HomeBooksSeriesJournalsReference CollectionseBooksInformationSalesImprintsFor Authors
            
  Top » Catalog » Books » My Account  |  Cart Contents  |  Checkout   
Quick Find
  
Use keywords to find the product you are looking for.
Advanced Search
What's New? more
Fetal Alcohol Syndrome: Recognition, Differential Diagnosis and Long-Term Effects
$73.80
Shopping Cart more
0 items
Information
Shipping & Returns
Privacy Notice
Conditions of Use
Contact Us
Notifications more
NotificationsNotify me of updates to Lithography: Principles, Processes and Materials
Tell A Friend
 
Tell someone you know about this product.
Lithography: Principles, Processes and Materials
Retail Price: $245.00
10% Online Discount
You Pay:

$220.50
Editors: Theodore C. Hennessy
Book Description:
Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nonfabrication technologies and manufacturing of integrated circuits (IC). Optical lithography was the first and the earliest microfabrication technology used in semiconductor IC manufacturing. It is still the main tool of lithography in today's very large scale integrated circuits and MEMS. This book presents topical research from across the globe in the study of lithography; its principles, processes and materials. Topics discussed herein include nanofabrication in electron beam lithography; submicron gratings prepared by laser interference lithography; thermal electric field imprinting lithography; local anodic oxidation and other alternative lithography techniques; as well as nanosphere lithography to enable plasmonic applications. (Imprint: Nova)



We’ve partnered with Copyright Clearance Center to make it easy for you to request permissions to reuse Nova content.
For more information, click here or click the "Get Permission" button below to link directly to this book on Copyright Clearance Center's website.


Please click on a chapter below to purchase separately

Chapter 1 - Principle, Processes and Materials for Nanoimprint Lithography pp. 1-44
Authors / Editors: (Hongbo Lan, Yucheng Ding, Hongzhong Liu, State Key Laboratory for Manufacturing System Engineering, Xi’an Jiaotong University, China, and others)

Chapter 2 - Nanofabrication in Electron Beam Lithography pp. 45-95
Authors / Editors: (Shih Chun Tseng, Bin-Cheng Yao, Chuen Horng Tsai, Nano Technology Research Center, Industrial Technology Research Institute, Hsinchu, Taiwan, R.O.C., and others)

Chapter 3 - Generation of Micropatterns on Side Surfaces of Polymer and Si Substrates Using a Micropunching Lithography Approach ) pp. 97-117
Authors / Editors: (Cheng Luo, Department of Mechanical and Aerospace Engineering, University of Texas, Arlington, Texas

Chapter 4 - Lithography: Principles, Processes and Materials pp. 119-132
Authors / Editors: (Shaoli Zhu, Yongqi Fu, Junzhan Hou, School of Mechanical & Aerospace Engineering, Nanyang Technological University, Singapore, and others)

Chapter 5 - Laser Interference Lithography pp. 133-148
Authors / Editors: (Henk van Wolferen, Leon Abelmann, MESA+ Research Institute for Nanotechnology, University of Twente, Enschede, The Netherlands)
***Open Access Chapter. Free Download Available***

Chapter 6 - Thermal Electric Field Imprinting Lithography: Fundamentals and Applications pp. 149-163
Authors / Editors: (A.A.Lipovskii, V.G.Melehin, M.I. Petrov, Yu. P. Svirko, St. Petersburg State Polytechnical University, St. Petersburg, Russia, and others)

Chapter 7 - Modification of and Fabrication of Stamp for Large Area UV-Nanoimprint Lithography pp. 165-174
Authors / Editors: (Weimin Zhou, Jing Zhang, Yanbo Liu, Jianping Zhang, Key Lab of Nanotechnology Promotion Center (SNPC), Shanghai, China)

Chapter 8 - Local Anodic Oxidation Nanolithography on Silicon: Chemical Routes to Functional Nanostructures pp. 175-193
Authors / Editors: (Thomas Baumgaertel, Harald Graaf, Chemnitz University of Technology, Chemnitz, Germany)
***Open Access Chapter. Free Download Available***

Chapter 9 - Nanosphere Lithography to Enable Plasmonic Applications pp.195-243
Authors / Editors: (Yue Bing Zheng, Tony Jun Huang, Department of Engineering Sciences and Mechanics, The Pennsylvania State University, University Park, Pennsylvania

Chapter 10 - Diamond and Three Dimensional Nanoimprint Lithography pp.245-271
Authors / Editors: (Jun Taniguchi, Department of Applied Electronics, Tokyo University of Science, Noda, Chiba, Japan)

   Series:
      Engineering Tools, Techniques and Tables
      Nanotechnology Science and Technology
   Binding: Hardcover
   Pub. Date: 2011 - 2nd Quarter
   Pages: 285.pp
   ISBN: 978-1-61761-837-6
   Status: AV
  
Status Code Description
AN Announcing
FM Formatting
PP Page Proofs
FP Final Production
EP Editorial Production
PR At Prepress
AP At Press
AV Available
  
Customers who bought this product also purchased
Piezoelectric Actuators
Piezoelectric Actuators
An Introduction to Electrostatic Measurements
An Introduction to Electrostatic Measurements
Green Composites:  Properties, Design and Life Cycle Assessment
Green Composites: Properties, Design and Life Cycle Assessment
Explosive Materials: Classification, Composition and Properties
Explosive Materials: Classification, Composition and Properties
Ventilation: Types, Standards and Problems
Ventilation: Types, Standards and Problems
Smart Sensors and Sensing Technology
Smart Sensors and Sensing Technology
Special Focus Titles
01.Violent Communication and Bullying in Early Childhood Education
02.Cultural Considerations in Intervention with Women and Children Exposed to Intimate Partner Violence
03.Chronic Disease and Disability: The Pediatric Lung
04.Fruit and Vegetable Consumption and Health: New Research
05.Fire and the Sword: Understanding the Impact and Challenge of Organized Islamism. Volume 2

Nova Science Publishers
© Copyright 2004 - 2020

Lithography: Principles, Processes and Materials