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Lithography: Principles, Processes and Materials
Retail Price: $245.00
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Editors: Theodore C. Hennessy
Book Description:
Lithography, the fundamental fabrication process of semiconductor devices, has been playing a critical role in micro-nonfabrication technologies and manufacturing of integrated circuits (IC). Optical lithography was the first and the earliest microfabrication technology used in semiconductor IC manufacturing. It is still the main tool of lithography in today's very large scale integrated circuits and MEMS. This book presents topical research from across the globe in the study of lithography; its principles, processes and materials. Topics discussed herein include nanofabrication in electron beam lithography; submicron gratings prepared by laser interference lithography; thermal electric field imprinting lithography; local anodic oxidation and other alternative lithography techniques; as well as nanosphere lithography to enable plasmonic applications. (Imprint: Nova)

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Chapter 1 - Principle, Processes and Materials for Nanoimprint Lithography pp. 1-44
Authors / Editors: (Hongbo Lan, Yucheng Ding, Hongzhong Liu, State Key Laboratory for Manufacturing System Engineering, Xi’an Jiaotong University, China, and others)

Chapter 2 - Nanofabrication in Electron Beam Lithography pp. 45-95
Authors / Editors: (Shih Chun Tseng, Bin-Cheng Yao, Chuen Horng Tsai, Nano Technology Research Center, Industrial Technology Research Institute, Hsinchu, Taiwan, R.O.C., and others)

Chapter 3 - Generation of Micropatterns on Side Surfaces of Polymer and Si Substrates Using a Micropunching Lithography Approach ) pp. 97-117
Authors / Editors: (Cheng Luo, Department of Mechanical and Aerospace Engineering, University of Texas, Arlington, Texas

Chapter 4 - Lithography: Principles, Processes and Materials pp. 119-132
Authors / Editors: (Shaoli Zhu, Yongqi Fu, Junzhan Hou, School of Mechanical & Aerospace Engineering, Nanyang Technological University, Singapore, and others)

Chapter 5 - Laser Interference Lithography pp. 133-148
Authors / Editors: (Henk van Wolferen, Leon Abelmann, MESA+ Research Institute for Nanotechnology, University of Twente, Enschede, The Netherlands)
***Open Access Chapter. Free Download Available***

Chapter 6 - Thermal Electric Field Imprinting Lithography: Fundamentals and Applications pp. 149-163
Authors / Editors: (A.A.Lipovskii, V.G.Melehin, M.I. Petrov, Yu. P. Svirko, St. Petersburg State Polytechnical University, St. Petersburg, Russia, and others)

Chapter 7 - Modification of and Fabrication of Stamp for Large Area UV-Nanoimprint Lithography pp. 165-174
Authors / Editors: (Weimin Zhou, Jing Zhang, Yanbo Liu, Jianping Zhang, Key Lab of Nanotechnology Promotion Center (SNPC), Shanghai, China)

Chapter 8 - Local Anodic Oxidation Nanolithography on Silicon: Chemical Routes to Functional Nanostructures pp. 175-193
Authors / Editors: (Thomas Baumgaertel, Harald Graaf, Chemnitz University of Technology, Chemnitz, Germany)
***Open Access Chapter. Free Download Available***

Chapter 9 - Nanosphere Lithography to Enable Plasmonic Applications pp.195-243
Authors / Editors: (Yue Bing Zheng, Tony Jun Huang, Department of Engineering Sciences and Mechanics, The Pennsylvania State University, University Park, Pennsylvania

Chapter 10 - Diamond and Three Dimensional Nanoimprint Lithography pp.245-271
Authors / Editors: (Jun Taniguchi, Department of Applied Electronics, Tokyo University of Science, Noda, Chiba, Japan)

      Engineering Tools, Techniques and Tables
      Nanotechnology Science and Technology
   Binding: Hardcover
   Pub. Date: 2011 - 2nd Quarter
   Pages: 285.pp
   ISBN: 978-1-61761-837-6
   Status: AV
Status Code Description
AN Announcing
FM Formatting
PP Page Proofs
FP Final Production
EP Editorial Production
PR At Prepress
AP At Press
AV Available
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Lithography: Principles, Processes and Materials