Nova Publishers
My Account Nova Publishers Shopping Cart
HomeBooksSeriesJournalsReference CollectionseBooksInformationSalesImprintsFor Authors
            
  Top » Catalog » Books » Nanotechnology » Lithography: Principles, Processes and Materials Chapters » My Account  |  Cart Contents  |  Checkout   
Quick Find
  
Use keywords to find the product you are looking for.
Advanced Search
What's New? more
Theory of Literature
$270.00
Shopping Cart more
0 items
Information
Shipping & Returns
Privacy Notice
Conditions of Use
Contact Us
Notifications more
NotificationsNotify me of updates to Nanofabrication in Electron Beam Lithography pp. 45-95
Tell A Friend
 
Tell someone you know about this product.
Nanofabrication in Electron Beam Lithography pp. 45-95 $100.00
Authors:  (Shih Chun Tseng, Bin-Cheng Yao, Chuen Horng Tsai, Nano Technology Research Center, Industrial Technology Research Institute, Hsinchu, Taiwan, R.O.C., and others)
Abstract:
Miniaturization is the central topic in up-to-date fabrication technology. Many of the
elements used in recent products are getting smaller and smaller. The electron beam
lithography (EBL) is one of the best techniques on fabricating patterns at the nanometer scale.
Many structures and devices have been successfully developed by EBL.
EBL is an attractive defined method for nano-scale device research for its varied
characteristics such as direct-writing, high resolution, flexibility, and compatibility. The
definition of nanostructure fabrication starts from scanning a focused electron beam on resist
film, and deposited energy to form desired patterns. The short wavelength of electron beam
develops extremely fine beams provide the platform of nanofabrication. The EBL system is
therefore considered to be a powerful tool in fabricating mask productions and prototyping
devices in fundamental research nowadays.
The purpose of this article is to advance the development of application of electron beam
lithography in the carbon nanotube (CNT) based device and 3D nanostructure in cylinder
roller. Details are illustrated as three sessions.
Session 1 briefly introduces the electron beam lithography system. It aims to overview
the EBL technique from the system, which included SEM based, electron beam resist and
physical interaction process. 


Available Options:
Version:
This Item Is Currently Unavailable.
Special Focus Titles
01.Violent Communication and Bullying in Early Childhood Education
02.Cultural Considerations in Intervention with Women and Children Exposed to Intimate Partner Violence
03.Chronic Disease and Disability: The Pediatric Lung
04.Fruit and Vegetable Consumption and Health: New Research
05.Fire and the Sword: Understanding the Impact and Challenge of Organized Islamism. Volume 2

Nova Science Publishers
© Copyright 2004 - 2021

Nanofabrication in Electron Beam Lithography pp. 45-95