Nanofabrication in Electron Beam Lithography pp. 45-95
Authors: (Shih Chun Tseng, Bin-Cheng Yao, Chuen Horng Tsai, Nano Technology Research Center, Industrial Technology Research Institute, Hsinchu, Taiwan, R.O.C., and others)
Abstract: Miniaturization is the central topic in up-to-date fabrication technology. Many of the elements used in recent products are getting smaller and smaller. The electron beam lithography (EBL) is one of the best techniques on fabricating patterns at the nanometer scale. Many structures and devices have been successfully developed by EBL. EBL is an attractive defined method for nano-scale device research for its varied characteristics such as direct-writing, high resolution, flexibility, and compatibility. The definition of nanostructure fabrication starts from scanning a focused electron beam on resist film, and deposited energy to form desired patterns. The short wavelength of electron beam develops extremely fine beams provide the platform of nanofabrication. The EBL system is therefore considered to be a powerful tool in fabricating mask productions and prototyping devices in fundamental research nowadays. The purpose of this article is to advance the development of application of electron beam lithography in the carbon nanotube (CNT) based device and 3D nanostructure in cylinder roller. Details are illustrated as three sessions. Session 1 briefly introduces the electron beam lithography system. It aims to overview the EBL technique from the system, which included SEM based, electron beam resist and physical interaction process.