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Nanofabrication in Electron Beam Lithography pp. 45-95 $100.00
Authors:  (Shih Chun Tseng, Bin-Cheng Yao, Chuen Horng Tsai, Nano Technology Research Center, Industrial Technology Research Institute, Hsinchu, Taiwan, R.O.C., and others)
Miniaturization is the central topic in up-to-date fabrication technology. Many of the
elements used in recent products are getting smaller and smaller. The electron beam
lithography (EBL) is one of the best techniques on fabricating patterns at the nanometer scale.
Many structures and devices have been successfully developed by EBL.
EBL is an attractive defined method for nano-scale device research for its varied
characteristics such as direct-writing, high resolution, flexibility, and compatibility. The
definition of nanostructure fabrication starts from scanning a focused electron beam on resist
film, and deposited energy to form desired patterns. The short wavelength of electron beam
develops extremely fine beams provide the platform of nanofabrication. The EBL system is
therefore considered to be a powerful tool in fabricating mask productions and prototyping
devices in fundamental research nowadays.
The purpose of this article is to advance the development of application of electron beam
lithography in the carbon nanotube (CNT) based device and 3D nanostructure in cylinder
roller. Details are illustrated as three sessions.
Session 1 briefly introduces the electron beam lithography system. It aims to overview
the EBL technique from the system, which included SEM based, electron beam resist and
physical interaction process. 

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Nanofabrication in Electron Beam Lithography pp. 45-95