Modification of and Fabrication of Stamp for Large Area UV-Nanoimprint Lithography pp. 165-174
Authors: (Weimin Zhou, Jing Zhang, Yanbo Liu, Jianping Zhang, Key Lab of Nanotechnology Promotion Center (SNPC), Shanghai, China)
Abstract: Nanoimprint lithography (NIL) with low cost, high-throughput and high resolution of patterning of microstructure has attracted much attention in comparison with other conventional techniques. And it has been added to the International Technology Roadmap for Semiconductors (ITRS) for the 16 and 11nm nodes. It has significant potential for various fields, such as photonic, electronics and biological application. In this chapter, we will mainly address some issues, the development of our research on UV-nanoimprint lithography. First, a commercially available Silane was acted as release agent on the quartz mold surface by vapor deposition. The monolayer was selfassembled on the quartz surface to detach easily from the imprinted resist. Then, we will introduce the critical technology for the fabrication of soft stamp over large area, which is suitable for large area UV-nanoimprint lithography. The replicated soft mold based on Anodic alumina oxide (AAO) membrane has an application in the fabrication of photonic crystal, such as enhance the output of GaN light emitting diode.